| 摘要 |
PURPOSE:To always perform transferring of a pattern with favorable resolution by a method wherein discrepancy of a focus is measured electrically, an applying voltage between a photoelectric mask and a sample is regulated according to an electric signal thereof, and photoelectrons from the photoelectric mask are converged accurately on the sample. CONSTITUTION:A light source 11a and a light receiving element 12a are provided on the upper side of the photoelectric mask 3 in a vacuum vessel 1, the vertical position of the mask 3 is detected from output of the light receiving element 12a, and the vertical position of the sample 4 is detected similarly according to a light source 11b and a light receiving element 12b. The interval (d) between the mask and the sample is detected 13 from the difference between outputs of the elements 12a, 12b, and the applying voltage is controlled 14 according to (d). Moreover a Hall element 15 is provided in the vessel to detect intensity of a magnetic field, and the applying voltage is controlled 14 corresponding to the variation of the magnetic field. According to this construction, even when the variation of the distance (d) to be generated according to the exchange of the mask 3 or the sample 4, or the variation of the magnetic field accordng to the change of the current of converging magnets 7 is generated, photoelectrons from the mask 3 can be converged accurately on the sample 4, and favorable transferring can be attained. |
