发明名称 |
Photo-assisted CVD |
摘要 |
A process and apparatus for depositing a film from a gas involves introducing the gas to a deposition environment containing a substrate, heating the substrate, and irradiating the gas with radiation having a preselected energy spectrum, such that a film is deposited onto the substrate. In a preferred embodiment, the energy spectrum of the radiation is below or approximately equal to that required to photochemically decompose the gas. In another embodiment, the gas is irradiated through a transparent member exposed at a first surface thereof to the deposition environment, and a flow of substantially inert gaseous material is passed along the first surface to minimize deposition thereon.
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申请公布号 |
US4435445(A) |
申请公布日期 |
1984.03.06 |
申请号 |
US19820377738 |
申请日期 |
1982.05.13 |
申请人 |
ENERGY CONVERSION DEVICES, INC. |
发明人 |
ALLRED, DAVID D.;WALTER, LEE;REYES, JAIME M.;OVSHINSKY, STANFORD R. |
分类号 |
C23C16/04;C23C16/48;G03G5/08;(IPC1-7):C23C13/00 |
主分类号 |
C23C16/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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