发明名称 EXPOSURE METHOD
摘要 PURPOSE:To perform pattern exposure without contacting the original, by enclosing a resist on the surface of a round rod with a conical face mirror. CONSTITUTION:A negative on which a pattern is formed is irradiated by a light source 1 and a condenser lens 2. Transmitted light passes through a projection lens 4 and reflected by a conical face mirror 5, and the pattern is printed on the surface of a round metallic rod coated with the resist. The conical face mirror 5 is constituted by a highly reflective multilayer film mirror. The central part of it is cut off and the round metallic rod 6 is inserted into it. The angle theta is so determined that the virtual image face 8 of transmitted light 9 formed by the conical face mirror 5 becomes a plane. The round rod is columnar and can be exposed at a time and no seam appears between patterns.
申请公布号 JPS5938749(A) 申请公布日期 1984.03.02
申请号 JP19820150428 申请日期 1982.08.30
申请人 DAINIPPON INSATSU KK 发明人 WATANABE KAZUO;HASHIMOTO TAKAO
分类号 G03B27/14;G03F7/20;G03F7/24 主分类号 G03B27/14
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