| 摘要 |
PURPOSE:To form efficiently a stable photosensitive layer on the surface of a conductive substrate in the stage of producing the photoreceptor by photochemical reaction, by supplying a gaseous medium toward the surface of the substrate while moving the substrate at a prescribed speed. CONSTITUTION:A substrate 5 is rotated at a prescribed speed in a reactor 2 and electricity is conducted to a sheathed heater 17 to maintain the prescribed temp. on the lateral circumferential part of the substrate 5. A reacting gas is ejected from the ejection port 8a of an introducing pipe 7a under irradiation of UV light from a light source 15 toward the substrate 5 in the reactor 2. On the other hand, a carrier gas is admitted into a bomb 14 in which mercury vapor is stored to carry the mercury. The gaseous medium thus produced is ejected from the ejection ports 8b of the 2nd introducing pipe 7b. The UV light is irradiated to the position where the reacting gas and the gaseous medium coexist to induce photochemical reaction and the activated silicon molecules deposit on the surface of the lateral circumferential part of the substrate 5. An amorphous silicon film, etc. are uniformly formed by this method. |
