发明名称 VACUUM DEPOSITION DEVICE
摘要 PURPOSE:To provide a titled device which prevents the deposition and solidification of the metal in a vacuum deposition chamber and improves the working efficiency of the device, by the constitution wherein a slight space is formed between a rotary cell and a cover connecting to a hood to prevent the leakage of the vapor of vapor deposition metal. CONSTITUTION:A slight clearance 13 in which a steel strip is passed is formed between a cover 12 connecting to a hood 20 and a rotary cell 9 under rotation in an arrow 28 direction in a vacuum chamber 7 to prevent the leakage of metallic vapor 23 to the inside 8 of the chamber 7 in a vacuum deposition device which depposits the vapor 23 evaporating from the molten metal 16 in a crucible 15 by evaporation on the strip 1 wrapped on the cell 9 and passed in said chamber by guiding the vapor with a hood 20 through a vapor deposition port 22. Heaters 10, 11, 19 are provided respectively to the cell 9, the cover 12 and the hood 20 to heat the vapor 23 to the reevaporation temp. or above, whereby the vapor deposition of the vapor 23 is prevented, the need for cleaning and maintaining the entire part of the chamber 7 is eliminated and the working efficiency of the device is improved.
申请公布号 JPS5938382(A) 申请公布日期 1984.03.02
申请号 JP19820146909 申请日期 1982.08.26
申请人 MITSUBISHI JUKOGYO KK;NITSUSHIN SEIKOU KK 发明人 YANAGI KENICHI;TAGUCHI TOSHIO;WADA TETSUYOSHI;FURUKAWA HEIZABUROU;WAKE KANJI
分类号 C23C14/56 主分类号 C23C14/56
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