发明名称 PLASMA CVD DEVICE
摘要 PURPOSE:To deposit uniformly a photoreceptor film, etc. having good reproducibility on a base body, by forming a cathode electrode disposed in a vacuum chamber into a discoid double construction to form a gas chamber, and providing gas releasing ports to the electrode in a radial array. CONSTITUTION:A discoid base body 2 is set in a vacuum chamber 3, and a cathode electrode 1 formed with a gas chamber by a discoid double-walled construction is disposed to the body 2. Gas releasing holes 11 are opened in a radial array from the center of such electrode 1. A gaseous raw material is fed through a gas supply pipe 8 to the gas chamber in the electrode 1 to fill the chamber; thereafter, the gas is released through the respective holes 1 toward the body 2. Screw holes are worked in the holes 11 and the unnecessary holes 11 are closed with screws, etc. whereby the flow rate of the releasing gas is controlled. An amorphous silicon film, etc. having good uniformity and reproducibility in the thickness of the vapor deposited film are formed on the body 2 by the above- mentioned device.
申请公布号 JPS5938374(A) 申请公布日期 1984.03.02
申请号 JP19820147931 申请日期 1982.08.26
申请人 CANON KK 发明人 FUJIYAMA YASUTOMO;KAMIYA OSAMU
分类号 C23C16/50;C23C16/509;G03G5/08;H01L21/205;H01L31/0248 主分类号 C23C16/50
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