发明名称 FORMATION OF SMALL DIMENSIONED APERTURES
摘要 Disclosed are methods for aperturing thin members by photochemical masking, exposing and etching techniques, such thin members may be a thin film of insulating material deposited or formed on a semiconductor substrate, or they may be a thin sheet or layer of material, such as metal.
申请公布号 US3653898(A) 申请公布日期 1972.04.04
申请号 USD3653898 申请日期 1969.12.16
申请人 TEXAS INSTRUMENTS INC. 发明人 PATRICK W. SHAW
分类号 H01L21/00;H01L23/482;H01L29/00;(IPC1-7):03C5/00 主分类号 H01L21/00
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