| 摘要 |
PURPOSE:To prevent the unevenness of application, by providing a semiconductor wafer storing vessel rotatably and generating an air current between a wafer and the inside wall of the vessel to prevent a thin film of a resist from being formed. CONSTITUTION:An upper cup 21 as the semiconductor wafer storing vessel is connected on a lower cup 22 through a bearing 23 and is rotated by coupling gears 24 and 26 and a driving motor 25. Plural blades 321-3212 are attached to the inside wall of the upper part of the upper cup 21. A water 29 is held by a vacuum chuck 28 and is rotated by a motor 27, and the upper cup 21 is rotated in the same direction, and a resist liquid is discharged from a nozzle 30 to form a film; and in this case, an air curtain 34 of an air current is generated as shown in Fig. Consequently, the scattered resist strikes against the curtain 34 and is discharged downward. Thereforce, the rebound of the resist from the wall face and the formation of a resist film are prevented to prevent the unevenness of application. |
