| 摘要 |
<p>A developer comprising (A) at least one solvent selected from N,N-dimethylacetamide, N-methyl-2-pyrrolidone, N,N-dimethylformamide, dimethylsulfoxide and gamma -butyrolactone, (B) methanol and (C) at least one solvent represented by the formula:
R<1>OCH2CH2OCH2CH2OR<2>
wherein R<1> is a hydrogen atom or R<2>, and R<2> is an alkyl group having 1 to 4 carbon atoms, is used to remove areas of photosensitive polyimide precursor which have not been exposed to actinic radiation when forming a polyimide pattern on a base plate by exposing imagewise to actinic radiation through a mask a layer of photosensitive polyimide precursor on the base plate, removing unexposed area using a developer and curing the resultant pattern of the polyimide precursor. The resulting pattern may be used as an insulator or a protective coating for multi-layered semiconductor integrated circuits. </p> |
