发明名称 COMPOSITION FOR FORMING PATTERN HARDENABLE WITH ULTRAVIOLET RAYS
摘要 PURPOSE:To obtain a compsn. superior in strippability of the hardened film and hardenability, by mixing the monoester compd. of an acid anhydride and a monomer having a hydroxyl group and a (meth)acryloyl group, dicyclopentenyloxyalkyl (meth)acrylate, and a photosensitizer. CONSTITUTION:The compsn. consists of (A) a monoester compd. of an acid anhydride having general formula I where R is H or CnH2n+1, n=1-4, and a monomer having at least one hydroxyl group and at least one (meth)acryloyl group in the molecule, (B) dicyclopentenyloxyalkyl (meth)acrylate, and (C) a photosensitizer. As said monoester compd. (A), a compd. of said monomer and an acid anhydride, such as hexahydrophthalic anhydride or 3-methylhexahydrophthalic anhydride, is preferable. As (B) dicyclopentenyl (meth)acrylate, dicyclopentenyloxyethyl (meth)acrylate, etc. are usable. As (C), benzoyn theyl and butyl ethers, etc. are usable.
申请公布号 JPS5931947(A) 申请公布日期 1984.02.21
申请号 JP19820141663 申请日期 1982.08.17
申请人 MITSUI TOATSU KAGAKU KK 发明人 NISHIHARA KUNIO;OZAWA HIROSHI;SHIBUYA TAKEFUMI;MAKINO SHIGEO;ONO KAZUYOSHI
分类号 C08F2/00;C08F2/48;C08F20/00;C08F20/26;G03F7/027;G03F7/038 主分类号 C08F2/00
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