发明名称 Visual defect inspection of masks
摘要 An optical system and method for direct human eye visual inspection of specimens of photoresist coated masks for defects as small as 2 mu m. The specimens are uniformly illuminated with a partially coherent sodium light that has very high illuminance and constrast levels. The system consists of a high pressure (1-1.5 atmosphere) sodium lamp source projected onto the specimen by a Kohler-type illumination system.
申请公布号 US4432641(A) 申请公布日期 1984.02.21
申请号 US19810312277 申请日期 1981.10.16
申请人 RCA CORPORATION 发明人 CAPRARI, FAUSTO;GESHNER, ROBERT A.
分类号 G01N21/88;(IPC1-7):G01N21/88;G02B21/08 主分类号 G01N21/88
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