发明名称 |
Visual defect inspection of masks |
摘要 |
An optical system and method for direct human eye visual inspection of specimens of photoresist coated masks for defects as small as 2 mu m. The specimens are uniformly illuminated with a partially coherent sodium light that has very high illuminance and constrast levels. The system consists of a high pressure (1-1.5 atmosphere) sodium lamp source projected onto the specimen by a Kohler-type illumination system.
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申请公布号 |
US4432641(A) |
申请公布日期 |
1984.02.21 |
申请号 |
US19810312277 |
申请日期 |
1981.10.16 |
申请人 |
RCA CORPORATION |
发明人 |
CAPRARI, FAUSTO;GESHNER, ROBERT A. |
分类号 |
G01N21/88;(IPC1-7):G01N21/88;G02B21/08 |
主分类号 |
G01N21/88 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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