| 摘要 |
<p>PURPOSE:To detect exactly a foreign matter which becomes the cause of a defect of a printing pattern, by making a luminous flux and an optical path conform with a projecting optical system of a semiconductor printing device by adjusting an inspecting optical system of an inspecting device. CONSTITUTION:A beam from a laser tube 1 is deflected by a polygon mirror 2 and passes through a lens 2a, reflected by a half mirror 3 and a scanning mirror 4, and thereafter, condensed onto a reticle 6 by a lens 5. Also, a field lens which is not shown in the figure is provided in the vicinity of the reticle 6, and in a position of this field lens, a luminous flux of the beam is thin, therefore, generation of an aberration is suppressed and an inclination of a main light beam can be changed comparatively freely. Accordingly, an inclination characteristic of an optical path of an inspecting beam which is made incident on the reticle 6 is made to conform with an inclination characteristic of an optical path of a projecting beam of a semiconductor printing device by the field lens, and a position relation to a foreign matter being on the reverse side of the reticle or the surface of a pellicle can be inspected by the same position relation as the time of printing, therefore, a foreign matter which exerts an influence on printing can be detected exactly.</p> |
