发明名称 MEASURING DEVICE FOR FINE STRUCTURE OF EXTENDED X-RAY ABSORPTION EDGE
摘要 PURPOSE:To execute a measurement with a high accuracy by controlling a rotational angle of an X-ray reflecting mirror, and a sample position so that incident X-rays and an X-ray irradiating position to the reflecting mirror and the sample conform with a condition of a total reflection. CONSTITUTION:A rack base 13 is supported so as to be turnable through a yoke 13' by a revolving shaft which has been provided on a blanket 17, the rack base 13 is loaded with an X-ray slit 7, an incident X-ray detector 8, a sample chamber 9, and a sample transmission X-ray detector 12, and the rack base 13 is connected to an actuator 15 of a rack base 14. In this state, by turning the rack base 13 by the actuator 15, and controlling incident X-rays 2, and an X-ray irradiating position of an X-ray total reflecting mirror 6 and a sample 10 so as to conform with a condition of a total reflection, even if an energy of a fundamental wave of the X-rays 2 is below a prescribed value, its higher harmonics can be eliminated, and also scattered X-rays of a high energy and a fluorescent X-ray intensity can also be attenuated. Also, even if a fundamental wave energy of the X-rays 2 is varied by making the reflecting mirror 6 coincide with the revolving shaft of the rack base 13, the X-ray irradiating position on the sample 10 is not varied, therefore, the measurement can be executed with a high accuracy.
申请公布号 JPS62159031(A) 申请公布日期 1987.07.15
申请号 JP19860000233 申请日期 1986.01.07
申请人 HITACHI LTD 发明人 NAKANO ASAO
分类号 G01N23/06;G01N23/08 主分类号 G01N23/06
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