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发明名称
POSITIVE-TYPE PHOTORESIST COMPOSITIONS
摘要
申请公布号
GB2124400(A)
申请公布日期
1984.02.15
申请号
GB19830014459
申请日期
1983.05.25
申请人
* SUMITOMO CHEMICAL COMPANY LIMITED
发明人
MAKATO * HANABATA;AKIHIRO * FURUTA;SEIMEI * YASUI;KUNIKIKO * TANAKA
分类号
G03F7/022;G03F7/023;G03F7/032;H01L21/027;(IPC1-7):G03C1/52
主分类号
G03F7/022
代理机构
代理人
主权项
地址
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