发明名称 |
High rate magnetron sputtering of high permeability materials |
摘要 |
A magnetron sputtering apparatus for high permeable materials where the target may include first and second elements separated from one another by a gap and the magnetic field source preferably exceeds 1000 gauss adjacent a pole thereof. The source is preferably a solid, oriented crystal ferrite magnet. A number of different configurations are disclosed.
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申请公布号 |
US4431505(A) |
申请公布日期 |
1984.02.14 |
申请号 |
US19830508927 |
申请日期 |
1983.06.29 |
申请人 |
VAC-TEC SYSTEMS, INC. |
发明人 |
MORRISON, JR., CHARLES F. |
分类号 |
H01J37/34;(IPC1-7):C23C15/00 |
主分类号 |
H01J37/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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