| 摘要 |
PURPOSE:To prevent the generation of corrosion on a metallic surface constituting a reflection surface without generating cracks on a vapor deposited silica film under high humidity by forming the vapor deposited film of silica on the reflection surface of the substrate having the reflection surface of high reflectivity then heating the same in a specific temp. range. CONSTITUTION:An SiO2 vapor deposited film is formed and is then heated for 30-60min at 150-200 deg.C after of vapor depositing Al on the surface of a substrate of iron, Al, etc. to form a smooth reflection surface and vapor depositing SiO2 on such reflection surface as a protective film. The generation of cracks in the SiO2 film even in an atmosphere of >=70% relative humidity is obviated and the generation of corrosion in the Al reflection film is prevented. The reflection plate having excellent durability and high reflectivity is thus obtd. |
