| 发明名称 |
Dry resist development using downstream plasma generation. |
| 摘要 |
<p>A method for the dry development of photoresist. The photoresist coating of a silicon wafer is developed by the chemical reaction with the active species of a remotely generated plasma.</p> |
| 申请公布号 |
EP0100079(A2) |
申请公布日期 |
1984.02.08 |
| 申请号 |
EP19830107228 |
申请日期 |
1983.07.22 |
| 申请人 |
THE PERKIN-ELMER CORPORATION |
发明人 |
REINBERG, ALAN R.;STEINBERG, GEORGE N.;ZAROWIN, CHARLES B. |
| 分类号 |
G03F7/30;G03F7/36;(IPC1-7):03F7/26 |
主分类号 |
G03F7/30 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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