| 摘要 |
PURPOSE:To obtain an optical integrated circuit having excellent stability, etc. by forming optical waveguides each having a clad and core on a substrate by sputtering and photolithography, etc. using oxide glass such as SiO2 and connecting >=1 optical elements on the substrate. CONSTITUTION:A clad layer 31 consisting of SiO2 is formed on a substrate 1 side at the exit end consisting of the clad 11, core 12 and clad 13 of the optical element on the substrate 1 by sputtering wherein a high frequency electric field is applied to both of a target and the substrate 1. A core layer 32 is formed of metallic oxide glass such as TiO2, Ta2O5, CeO2 or chalcogenide glass or the like on the layer 31. A thin Ti film 26 and a resist layer 27 are successively provided on the layer 32, and after the pattern of waveguides is exposed and developed, the film 26 is plasma etched and with the remaining film 26 as a mask, the layer 32 is etched by sputtering, then SiO2 is sputtered to form a clad 33, whereby the waveguide is completed. The optical integrated circuit having the connection at a small light loss and high stability is thus obtd. |
