发明名称 RESIN COMPOSITION
摘要 PURPOSE:To form a microscopic pattern with high accuracy and efficiency, by using a polymer or copolymer having specified repeating units. CONSTITUTION:The present resin compsn. contains a compd. generating free radicals due to light or ionizing radiation, and a polymer or copolymer having repeating units each represented by general formula I in which R<1>-R<6> are each H, alkyl, alkoxy, halogen, haloalkyl, or haloalkoxy, and at least one of R<2>-R<6> is alkyl, alkoxy, haloalkyl, or haloalkoxy. A preferable amt. of said units to be used is >=20%, especially, >=50% of the total repeating structural units.
申请公布号 JPS5923341(A) 申请公布日期 1984.02.06
申请号 JP19820133018 申请日期 1982.07.30
申请人 NIPPON GOSEI GOMU KK 发明人 HARITA YOSHIYUKI;KAMOSHITA YOUICHI;HARADA TOKOU;KOSHIBA MITSUNOBU
分类号 G03F7/26;G03F7/038 主分类号 G03F7/26
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