| 摘要 |
PURPOSE:To prepare an absorbent liquid having high water resistance while maintaining absorption performance by using the adsorbent liquid of CuCl-tris (dimethylamino)phosphine oxide (HMPA)/toluene, and changing the amt. of HMPA and other solvents according to the moisture content in the gas to be treated. CONSTITUTION:It is preferred to maintain the concn. of CuCl in an absorbent liquid at 1.0-2.0mol/l, more preferably 1.5-2.0mol/l to maintain the amt. of CO to be absorbed in the absorbent liquid at a practicale value, and CuCl is dissolved in HMPA to form a CuCl-HmPA complex for said purpose. If the concn. is increased in order to improve water resistance, the viscosity increases and the absorption rate of CO decreases. Therefore, for example, toluene is further added as a low viscosity solvent to the soln. of CuCl-HMPA complex to adjust the viscosity. The parts shown by horizontal lines are the range where precipitate, that is, CuCl(S) is not formed, which covers a range where the water resistance is higher as the ratio of HMPA with respect to CuCl is higher. |
