发明名称 |
Photovoltaic device. |
摘要 |
<p>A photovoltaic device comprises a transparent substrate (21), an amorphous silicon layer structure of a p-i-n type formed on the substrate (21) and comprised of a p-layer (23), i-layer (24) and n-layer (25), and an electrode (26) formed on the amorphous silicon layer structure, of the p-layer (23) and n-layer (25) of the amorphous silicon layer structure, that layer on which light is incident is such that an optical forbidden band gap is greater on the i-layer side than on the substrate side.</p> |
申请公布号 |
EP0099720(A2) |
申请公布日期 |
1984.02.01 |
申请号 |
EP19830304053 |
申请日期 |
1983.07.12 |
申请人 |
TOKYO SHIBAURA DENKI KABUSHIKI KAISHA |
发明人 |
NOZAKI, HIDETOSHI;KAMIMURA, TAKAAKI;HATAYAMA, TAMOTHU;UTAGAWA, TADASHI |
分类号 |
H01L31/04;H01L31/0392;H01L31/075;H01L31/105;(IPC1-7):01L31/06;01L31/10;01L31/02 |
主分类号 |
H01L31/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|