发明名称 Photovoltaic device.
摘要 <p>A photovoltaic device comprises a transparent substrate (21), an amorphous silicon layer structure of a p-i-n type formed on the substrate (21) and comprised of a p-layer (23), i-layer (24) and n-layer (25), and an electrode (26) formed on the amorphous silicon layer structure, of the p-layer (23) and n-layer (25) of the amorphous silicon layer structure, that layer on which light is incident is such that an optical forbidden band gap is greater on the i-layer side than on the substrate side.</p>
申请公布号 EP0099720(A2) 申请公布日期 1984.02.01
申请号 EP19830304053 申请日期 1983.07.12
申请人 TOKYO SHIBAURA DENKI KABUSHIKI KAISHA 发明人 NOZAKI, HIDETOSHI;KAMIMURA, TAKAAKI;HATAYAMA, TAMOTHU;UTAGAWA, TADASHI
分类号 H01L31/04;H01L31/0392;H01L31/075;H01L31/105;(IPC1-7):01L31/06;01L31/10;01L31/02 主分类号 H01L31/04
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