发明名称 HIGH SPEED FLUID DRY POLISHING METHOD
摘要 PURPOSE:To enable a work to be uniformly satisfactorily polished by locating the work beneath a spindle in fluid polishing by which the work mounting spindle is revolved and rotated on its own axis in a polishing tank which is filled with a medium. CONSTITUTION:Works 15, 15' are mounted in jigs 14, 14' of spindles 13, 13' at a lowered position of a polishing tank 1. The polishing tank filled with abrasives consisting of grease and grains and added to wooden system medium to be stirred and mixed therewith is lifted. When a pulley 6 is rotated at the upper limit position of the polishing tank, the spindles 13, 13' revolve and rotate on their own axes to alternate forward and backward rotation of a drive motor every predetermined time for polishing. Since the works 15, 15' are located beneath the spindles 13, 13', the medium 2 contacts the whole surface of the works with sufficient pressure to polish the works wholly uniformly and satisfactorily without needing any repolishing operation and manual repair of defectively polished surface after polishing.
申请公布号 JPS5919669(A) 申请公布日期 1984.02.01
申请号 JP19820128202 申请日期 1982.07.22
申请人 UEMURA KOGYO KK;WAIDOMAN:KK 发明人 MATSUMOTO HIROSHI;FUJIKI MITSURU;TAMURA TSUYOSHI
分类号 B24B31/10;B24B31/00 主分类号 B24B31/10
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