发明名称 PHOTOMASK MATERIAL AND PHOTOMASK
摘要 PURPOSE:To prevent deterioration of light transmittance, to reduce reflectance, and to raise glass strength, by forming a glass tarnish preventing layer on both sides of a glass substrate or on one side opposite to a hard mask formed layer to prevent bluing tarnish on the surface of the glass substrate. CONSTITUTION:Tarnish preventing layers 3, 3' are formed on both sides of the substrate 4 of a soda lime glass, alumina silicate glass, or the like, or on one side opposite to a hard mask formed layer by vapor depositing a material having characteristics small in refractive index, high in surface hardness, almost transparent to light from a baking light source, and unattacable by an etchant. A Cr layer 1, a chromium oxide layer 2, and a photoresist layer 5 are formed on the layer 3' or the substrate 4 to form a photomask R. The layers 3, 3' prevent the phenomenon of bluing tarnish that the substrate 4 reacts with moisture in the air and forms a number of fine crystal group, and when they grow coarse, they opacify the outside surface of the photomask a little, deteriorate transmittance, cause local corrosion and defects on the mask pattern.
申请公布号 JPS5918947(A) 申请公布日期 1984.01.31
申请号 JP19820128438 申请日期 1982.07.22
申请人 KONISHIROKU SHASHIN KOGYO KK 发明人 ONO SAKAE
分类号 G03F1/00;G03F1/48;H01L21/027 主分类号 G03F1/00
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