发明名称 Method and apparatus for depositing conducting oxide on a substrate
摘要 There is described a method and an apparatus for depositing oxide, such as zinc oxide, on a substrate by R.F. magnetron sputtering. The oxide deposit is "switched" from a non-conducting to a highly conducting material by a second discharge caused by a voltage applied to a screen grid immediately in front of the substrate, or is rendered conducting by a heating step.
申请公布号 US4428810(A) 申请公布日期 1984.01.31
申请号 US19820377324 申请日期 1982.05.12
申请人 CANADIAN PATENTS AND DEVELOPMENT LIMITED 发明人 WEBB, JAMES B.;WILLIAMS, DIGBY F.;BUCHANAN, MARGARET A.
分类号 C03C17/245;C23C14/08;C23C14/54;H01B1/08;H01J37/34;(IPC1-7):C23C15/00 主分类号 C03C17/245
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