发明名称 ELECTRON BEAM POSITIONING CONTROL UNIT FOR SCANNING TYPE ELECTRON MICROSCOPE
摘要 PURPOSE:To obtain the accurate surface voltage distribution of a sample by storing the low and high magnification measurement data of the sample and positioning the sample position of the high magnification scanning based on the displayed positional information of section to be measured by the low magnification data. CONSTITUTION:When an aluminum pattern in the array block 31 of semiconductor memory 1 is accurately exposed to beams, scanning is stopped once after scanning the block 31 including another block in low magnification by the control of a SEM control section 9 for the first time. In this case, measurement voltage data is stored in a storage device 12. Then the data is read in the CPU16 after aligning a cursor with the center of the pattern to be measured of a displayed picture on a display unit 13. The CPU16 calculates the travel of a stage 8 and moves it. Furthermore, scanning is stopped once more after performing the high magnification scanning and the data is stored in a storage device 14. The CPU16 calculates the travel of the stage and moves it in the same way. Besides, the data is stored in the storage device 12 after performing the high magnification scanning. As a result, accurate voltage distribution can be measured by positioning the sample position using such a short time scanning.
申请公布号 JPS5918554(A) 申请公布日期 1984.01.30
申请号 JP19820127861 申请日期 1982.07.22
申请人 TOKYO SHIBAURA DENKI KK 发明人 SANO TETSUYA;MIYOSHI MOTOSUKE
分类号 H01J37/147;H01J37/28 主分类号 H01J37/147
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