发明名称 THERMAL PROCESSING FOR AMORPHOUS MAGNETIC MATERIAL
摘要 PURPOSE:To improve permeability in a high frequency region by combining the thermal processings under the rotating magnetic field and vertical magnetic field and by selecting temperature to the specified relation. CONSTITUTION:An amorphous magnetic thin plate 1 is placed under the thermal processing in the rotating magnetic field and vertical magnetic field. In this case, the thermal processing under vertical magnetic field is carried out following the processing under the rotating magnetic field or this sequence may be inverted. In any case, a temperature Ta2 of the thermal processing to be executed first should satisfy the following relation. Namely, the temperature Ta1 is 300 deg.C or higher and is not higher than the Curie temperature Tc of amorphous magnetic material, while the temperature Ta2 is equal to Ta1 or lower and is 250 deg.C or higher but 350 deg.C or lower. Thereby, an inductive magnetic anisotropy can be controlled on the basis of three dimension and permeability in a frequency region as high as 10kHz or higher can be improved.
申请公布号 JPS5914609(A) 申请公布日期 1984.01.25
申请号 JP19820123487 申请日期 1982.07.15
申请人 SONY KK 发明人 MATSUDA HIDEKI;ASO KOUICHI;KAMIHIRA AKIRA;OCHIAI YOSHITAKA;HAYAKAWA MASATOSHI;HOTAI KAZUHIDE;HAYASHI KAZUHIKO
分类号 C21D6/00;C22F1/00;H01F1/153 主分类号 C21D6/00
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