| 摘要 |
PURPOSE:To provide good magnetic property without annealing even at high deposition rate, by a method wherein amount of constituent in alloy is specified in a magnetic application device using thin film of Fe-Si-Al alloy, and relative intensity of (224) diffraction to (220) diffraction and diffraction by (113) superlattice in this alloy is in specified region. CONSTITUTION:On a photoceram substrate is formed a Sendust-alloy thin film including Si of 6-11wt%, Al of 4-8wt% and Fe as residual constituent by means of sputtering or the like, so that relative intensity of (224) diffraction to (220) diffraction and diffraction by (113) superlattice observed using CuKa ray of the alloy becomes not less than 5 and not less than 1, respectively. In this constitution, magnetic application device of good magnetic property can be efficiently formed without annealing the deposited thin film at high deposition rate thereby the magnetic application device of good magnetic property is obtained. |
