| 摘要 |
PURPOSE:To obtain a negative cyclized rubber type photoresist having superior adhesion to a substrate and high sensitivity, by using a cyclized conjugated diene type polymer having carboxylgroups. CONSTITUTION:An unsatd. monomer, such as acrylic or maleic acid is added to a homopolymer of conjugated diene monomer, such as isoprene, butadiene, or other pentadienes, or a copolymer of said diene and a monomer, such as styrene, ethylene, or acrylonirile. A cyclized rubber of a conjugated diene type polymer having 0.01-20mol of carboxylic groups or its precursor per 100mol of diene monomer is obtained by cyclizing said mixture. A photoresist compsn. is obtained by using said cyclized rubber and a photo-crosslinking agent, such as diazide compd., as main components, and mixing a sensitizing agent, and a storage stabilizer, when needed. |
