发明名称 INTEGRATED CIRCUIT
摘要 PURPOSE:To enable a DC voltage to be creased between a P well and an N substrate even if AC power is directly applied without a rectification circuit, by utilizing an N substrate, a P diffusion layer, a P well and an N diffusion layer formed in the course of manufacture of a CMOS IC for constructing full-wave rectification circuit for the P-N junction diode. CONSTITUTION:P-N junction diodes are formed between a P well contact 7 and an N diffusion layer 8 and between a P diffusion layer 9 and an N substrate contact 10. The P-N junction diodes are connected in series and an AC voltage is applied between a connection point 2 therebetween and another connection point 4 between another pair of diodes, so that a full-wave rectification circuit is thereby provided by two pairs of diodes. Thus, a positive full-wave rectification wveform is obtained in the N substrate 3 common to the tow pairs of diodes and a negative full-wave rectification waveform is obtained in the common P well 1. These waveforms can be smoothed by a capacitor 11 to provide a DC voltage, by which other CMOS circuit sections can be driven.
申请公布号 JPS62174964(A) 申请公布日期 1987.07.31
申请号 JP19860017103 申请日期 1986.01.28
申请人 NEC CORP 发明人 KATO NORIAKI
分类号 H01L21/8238;H01L21/8234;H01L27/06;H01L27/092;H02M7/08;H02M7/217 主分类号 H01L21/8238
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