发明名称 Chemical process apparatus
摘要 Disclosed is the continuous processing of flat workpieces such as printed circuit boards which are suspended by a hanger conveyorized for continuous horizontal transport. More specifically, the conveyorizing passes the workpieces through a plurality of chambers having slotted-end members, one such chamber spraying to remove the photoresist, and another such chamber spraying etching solution to remove the copper cladding. Each station has a slotted cover, and the conveyor suspends a plurality of workpiece holders, each of the holders being joined by chain links of an inert material which overlie the slot in the covers for the chambers. The photoresist chamber is provided with a continuous filter for cntinuously removing and filtering the sludge, thereby reducing the tendency of the removal solution to dilute and become ineffective. All of the chambers are modularized, and the system is compatible with continuous processing for the plating of the printed circuit boards.
申请公布号 US4427019(A) 申请公布日期 1984.01.24
申请号 US19820406199 申请日期 1982.08.09
申请人 MICRO-PLATE, INC. 发明人 EIDSCHUN, CHARLES D.
分类号 H05K3/00;H05K3/06;(IPC1-7):B08B3/02 主分类号 H05K3/00
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