| 摘要 |
PURPOSE:To prevent deterioration of resolution due to N2 production of a photoresist film, by forming a photoresist film coating a substrate, placing a photomask having a prescribed pattern on said film, and scanning the photomask with a light source having a small opening diameter to expose the film. CONSTITUTION:A glass substrate 2 for forming a working photomask having a Cr metallic film and a photoresist film laminated is allowed to face a master photomask 1 prepd. by forming a Cr metallic pattern on the glass substrate, and both are brought into intimate contact by using a jig 3 and evacuating the space between the substrates 1, 2. UV rays are allowed to scan the mask 1 through a slit 11 formed through a light shading plate 11 moved vertically and laterally in a prescribed pitch and speed, or the jig 3 may be moved while the plate 12 is fixed. Alternatively, the mask 1 may be scanned using a fiberscope 21 in place of the plate 12. As a result, this method prevents conventional troubles that the substrate 2 is uniformly irradiated in one time to rise in temp. decomposing the photoresist, producing N2, and deteriorating adhesion between the metallic film and the resist, and resolution of the pattern. |
