| 摘要 |
PURPOSE:To perform analysis with high sensitivity and high accuracy, by maintaining a source of high frequency-induced and combined plasma in a specified gaseous atmosphere, and thereby suppressing the background of the emission spectrum low and safe. CONSTITUTION:A supporting metallic fitting 4 is provided to the quartz tube 1 of a plasma torch, and supports >=1 gas-blowing tubes (two as 51 and 52 in the figure). >=1 gases selected from a group of He, Ne, Ar, Kr, Xe and N2 are blown to a plasma source 3 to prevent the appearance of band spectrum's background produced by biatomic molecule such as NO, CH, OH, NH, CN. Thus emission spectrochemical analysis is performed with high accuracy and high sensitivity with the use of a high frequency-induced and combined plasma as a beam source 3. |
