发明名称 Cleaning method and solvent for removing residue compositions containing both polar and non-polar materials.
摘要 <p>A process for cleaning both polar and non-polar residue material from screening masks, wherein the mask is contacted with a liquid solvent that at least includes a solvent selected from the group consisting of N-cyclohexyl-2-pyrrolidone, N-isopropyl-2-pyrrolidone, ethyl hexyl acetate, dibutyl carbitol and Magie Oil #6543.</p>
申请公布号 EP0098384(A2) 申请公布日期 1984.01.18
申请号 EP19830105264 申请日期 1983.05.27
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 MONDOU, EUGENE RAYMOND;SCHNEIDER, FREDERICK WILLIAM
分类号 B41F35/00;B41N1/24;B41N3/06;C11D7/26;C11D7/32;C11D7/50;H05K3/12;B41N3/00;(IPC1-7):11D7/50 主分类号 B41F35/00
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