| 摘要 |
PURPOSE:To enhance yield of drying by a method wherein wafers are put out one sheet by one sheet from a loader part, and the wafer thereof is dried every one sheet at a drying part, and is accommodated in an unloader. CONSTITUTION:The wafers in the cartrige 6 for a loader are put out one sheet by one sheet to the drying part 3 by a put-out pusher 21, put in the facing grooves of a pair of guides 22 on a rotary base 9, and is set in the condition enabled to prevent flying out by stopper pins 23. After then, the rotary base 9 is descended, and a cover 13 is also descended, and the inside of a drying chamber 11 is exhausted forcibly by an exhaust duct 12. Then, pure water is jetted to the wafer according to a nozzle 17 rotating the rotary base 9 in a low speed by a motor 10. After then, N2 gas is blown against the wafer according to the nozzle 17 rotating the rotary base 9 in a high speed. Accordingly, the wafer makes water to be scattered due to the centrifugal force by blowing of N2 gas in addition to concentrical rotation, and is dried. Scattered water is discharged from the exhaust duct 12, and is not readhered to the wafer. |
