| 摘要 |
PCT No. PCT/DE80/00031 Sec. 371 Date Jan. 25, 1981 Sec. 102(e) Date Jan. 23, 1981 PCT Filed Mar. 17, 1980 PCT Pub. No. WO80/02749 PCT Pub. Date Dec. 11, 1980.A reflection-reducing layer (S) between an incidence medium (E) and a highly reflecting surface (3) is described, wherein for the refractive index n1 of the incidence medium (E) and the refractive index n2 of the reflection-reducing layer (S) the relationship of n1=n2 or at least n1 &persp& n2 is valid and the reflection-reducing layer (S) has an absorbtivity such that no reflecting radiation components are emerging from it in the direction of the incidence medium (E). The reflection-reducing layer (S), conveniently consisting of two partial layers, is preferably constructed so that the first partial layer consists of the same material as the incidence medium (E), for example, germanium, and the second partial layer of the same material as the highly reflecting surface (3), for example, chromium. A process for the preparation of a reflection-reducing layer (S) of this type is further disclosed, said process being characterized by the layer thickness controlled vapor deposition in a high vacuum, wherein conveniently the material or the mixture of materials is deposited simultaneously or successively by means of sputtering and the thickness of the layer is controlled during the vapor deposition or sputtering by means of an oscillator crystal.
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