发明名称 |
METHOD AND DEVICE FOR MANUFACTURING OPTICAL PREFORM BY CHEMICAL GAS PHASE AXIAL METHOD |
摘要 |
Hydroxyl free deposition with high efficiency and at a high deposition rate may be achieved, even with use of relatively inexpensive raw materials, by utilizing a ring-shaped plasma activated axial chemical vapor deposition obtaining 100% chemical conversion and fractional volatilization of impurities. The plasma is induced in an annular stream of a plasma-forming gaseous medium, and the reactant or reactants used in the axial chemical vapor deposition are introduced into the center of the ring-shaped plasma to be converted by the heat of the plasma flame into soot which is deposited on a bait. An annular stream of a cooling medium flows outwardly past the plasma flame and is circumferentially centered by an extension of the outer tubular element of a plasma torch in which the plasma is generated. An RF generator which induces the plasma is operated at a frequency exceeding 20 MHz to give the plasma flame the desired ring-sloped configuration. |
申请公布号 |
JPS593036(A) |
申请公布日期 |
1984.01.09 |
申请号 |
JP19830106598 |
申请日期 |
1983.06.14 |
申请人 |
INTERN STANDARD ELECTRIC CORP |
发明人 |
DEIRITSUPU KUUMAA NASU;PABURO KAPUKO PUREZA;SHIN MUU OO |
分类号 |
C03B37/018;C03B8/04;C03B37/014;G02B6/00 |
主分类号 |
C03B37/018 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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