发明名称 |
Process for preparation of selective light absorptive methacrylic resins. |
摘要 |
<p>A methacrylic resin capable of selectively absorbing light rays having a wavelength of 580 nm is advantageously produced either by dispersing or dissolving neodymium compound in a resin-forming starting material selected from monomeric methyl methacrylate, a monomer mixture composed mainly of methyl methacrylate and partially pofyme- rized products thereof, and polymerizing the resin-forming starting material. A solvent capable of dissolving therein the resin-forming starting material and the neodymium compound may be incorporated in the resin-forming starting material.</p> |
申请公布号 |
EP0097527(A2) |
申请公布日期 |
1984.01.04 |
申请号 |
EP19830303572 |
申请日期 |
1983.06.21 |
申请人 |
MITSUBISHI RAYON CO. LTD. |
发明人 |
IDA, KOZO |
分类号 |
C08F2/44;C08F20/14;C08F265/06;(IPC1-7):08F20/14;08F2/44 |
主分类号 |
C08F2/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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