| 摘要 |
NEW MATERIAL:A compound expressed by the formula (R<1> represents vinyl or allyl; R<2> represents aryl; l, m and n are 1-10,000). EXAMPLE:A silylated polyorganosilsesquioxane. USE:Used for producing a recording layer for a semiconductor device, etc., and for forming a resist pattern. The compound has photosensitivity and heat resistance. PREPARATION:For example, pyridine is added to methyl isobutyl ketone and cooled to -60 deg.C. Vinyltrichlorosilane, phenyltrichlorosilane and an ion-exchanged water are added dropwise thereto and the reaction solution is slowly heated. Polycondensation reaction is then carried out at 120 deg.C for 5hr while bubbling nitrogen gas thereinto. After the reaction, the solution is washed with water and a methyl isobutyl ketone layer is fractionated. Trimethylchlorosilane and pyridine are then added and heated to silylate the unreacted hydroxyl group. |
