| 摘要 |
PURPOSE:To transfer the coating material easily to a foundation substrate with high accuracy by making an organic silicon acid and dyes having a peak within a predetermined wavelength range contain in an organic solvent and lowering an effect by reflection and scattering. CONSTITUTION:An Al film 12 of extremely high reflectivity is deposited on the Si substrate 11, to which a stepped difference is formed, through a method such as vacuum deposition method. Dyes oreosol first yellow GCN is added in an OCD solution containing Si(OH) as it is left as it is solid, and dissolved in ethyl alcohol, and the solution coating material is coated through a spin application method to obtain an Si oxide film 13. A positive type resist 14 is coated through the spin application method, and exposure and development are executed. An etching profile with an approximately vertical side wall is obtained through the etching of the film 13 while using the resist 14 as a mask and the etching of the Al film 12 by CCl4 gas while using the resist 14 as a mask. The film 13 is removed through immersion in a fluoric acid aqueous solution, and a film is formed. |
