| 摘要 |
PURPOSE:To accelerate the etching speed and to decrease a short side, by taking both major planes perpendicular to the Z axis, taking the direction of a long side as the Y axis and taking the direction of the short side as the X axis. CONSTITUTION:Both major planes of a crystal plate 11 are perpendicular to the Z axis, and a long side profile crystal plate 12 taking the direction of the long side as the Y axis and taking the direction of the short side as the X axis is processed from this crystal plate 11 with the photoetching processing. Both side faces are formed incorporatedly with lead sections 13, 14 and fixed sections 15, 16. An exciting electrode 18 for the long side oscillation is arranged to both side faces of the crystal plate 12 and arranged to the lead sections 13, 14 and the fixed sections 15, 16 as lead electrodes 19, 20. Through the constitution like this, a length l2 of the short side is decreased up to 0.1mm., further a series resonance resistance is suppressed lower because an exciting electric field is applied directly to the X axis, and since the etching plane is taken in the direction of the Z axis, the etching speed is faster. |
