| 摘要 |
PURPOSE:To obtain a novel ECD which is improved in visibility, driving voltage and long-term reliability, by coating indium tin oxide as a transparent electrode on one of electrode substrates, coating the pattern surface to be displayed on said indium tin oxide with a layer of the indium tin oxide doped with antimony, and coating the surface of the transparent electrode except the pattern to be displayed with an insulation film. CONSTITUTION:This ECD is produced by a method of vapor-depositing first indium tin oxide 10 on substrate glass 9 at the film thickness of roughly 10OMEGA/square sheet resistace. A layer of indium tin oxide 11 doped with antimony is vapor-deposited in the region corresponding to the pattern to be displayed thereon at 100-1,000Angstrom , more representatively 300-600Angstrom film thickness. Photoresist AZ-1350 is further coated as shown by 12 thereon except the parts to be removed of transparent electrodes 10, 11 in order to form a desired electrode pattern and is calcined. When the substrates are etched for about 1-2min in an aq. 50% bydrochloric acid soln. at about 40 deg. after the calcination, the resist is etched together with the electrodes 10, 11, whereby a desired electrode pattern is obtd. The remaining photoresist is stripped with a stripping agent to be used exclusively or acetone. An insulator 13 of a white or other color is screen-printed and is calcined for about 10min at 180 deg.C. |
