摘要 |
PURPOSE:To adjust smoothly the positioning of a mask, by erecting support pins which can be deflected and deformed in the plural places of a substrate holder, and pressing the mask to the forward ends of the support pins by means of a mask holder thereby making it possible to position and move the mask in parallel with the surface of the substrate to be vapor-deposited. CONSTITUTION:A mask supporting device of a vapor deposition device with masks supports elastically a platelike mask 21, which has an opening pattern 21A for forming a vapor deposition pattern, by means of a mask holder 17 by directing the same so as to face the surface 13A to be vapor-deposited of a substrate 13 supported on a substrate holder 10. Support pins 16 which can be deflected and deformed are erected in the plural places of said holder 10 and the mask 21 is pressed to the forward ends of the pins 16 by the holder 17, whereby the positioning and moving of the mask 21 in parallel with the surface 13A of the substrate 13 are made possible. |