| 摘要 |
PURPOSE:To improve incident electron beam application efficiency, reduce scattering loss of phosphor and accordingly improve phosphor taking out efficiency by vertically erecting a flat or pillared phosphor powder on the base plate and by forming a phosphor film having the film structure where a certain gap is provided. CONSTITUTION:As a phosphor material, powder having flat or pillared particle structure is used. Under the condition that a small area surface of phosphor is placed in contact on the base plate, namely it is erected on the base plate, the requirement that there is comparative space and a base plate covering rate of phosphor is large is also satisfied. The surface of flat phosphor particle is assumed as a circle and the average flatness obtained by dividing the diameter by thickness is selected to the value in the range from 1.5 to 5. Moreover, a film thickness is obtained from film density and Screen Weight and a number of film layers obtained by dividing such thickness with average particle size is selected to a value in the range of 2-5. |
