| 摘要 |
PURPOSE:To remove only a graphite layer on a photo-resistive layer in order to form a black matrix rapidly with the little quantity consumed and with low water pressure by forming a mold release agent layer between the photo-resistive layer and a graphite layer. CONSTITUTION:A photohardening photoresist is uniformly applied to the inside surface of a panel 1 in order to form a photo-resistive layer 2 after being dried. Next, said photo-resistive layer is exposed to light so that the positions, wherein phosphors of various colors are to radiate, are exposed to light 3 through a shadow mask in order to harden the photo-resistive layer 2a of the part to be exposed. The photo-resistive layer 2b of the nonexposure and nonhardening part is removed by dissolution by performing spray development with hot water. Then a suspension of a mold release agent is applied to the inside whole surface of the panel 1 while being dried to form the mold release agent 5. Next, when the panel is washed, the mold release agent layer 5a can be selectively formed. Subsequently, a graphite suspension is applied on the panel to form graphite coating 6 while the mold release layer 5a is resolved by treating with a solution not affecting graphite and the photoresist in order to produce a gap between a graphite layer and the photo-resistive layer. Next, when performing hot water spraying or the like, only the graphite layer 6a having the gap is washed. While the graphite layer 6b remains thus obtaining a black matrix film. |
