发明名称 SURFACE MODIFICATION OF POLYETHER ETHER KETONE RESIN MOLDING
摘要 PURPOSE:To obtain the titled molding excellent in durability, heat resistance, affinity for adhesive and printability, by exposing a polyether ether ketone resin molding to low-temperature plasma and then treating the molding with a specified low-molecular compound. CONSTITUTION:A treating chamber containing a polyether ether ketone resin molding is evacuated fully and then a gas having no plasma polymerizability (e.g., Ar) is introduced into the chamber so that the pressure in the chamber is 0.1-10 Torr. Low-temperature plasma is generated in the chamber by application of a high voltage. After disappearance of the plasma, a low-molecular compound having addition polymerizability (e.g., acrylic acid) is introduced in a gaseous state into the chamber to treat the molding. EFFECT:It is possible to impart improved affinity for adheisve, hydrophilicity, oleophilicity, etc. to a molding. USE:Printed circuit boards, heat-resistant insulating materials.
申请公布号 JPS58217526(A) 申请公布日期 1983.12.17
申请号 JP19820100570 申请日期 1982.06.14
申请人 SUMITOMO BAKELITE KK 发明人 KATSUMURA AKIFUMI
分类号 H05K1/03;B32B15/08;B32B15/088;B32B15/092;B32B15/095;C08J7/00;C08J7/18;H05K3/38 主分类号 H05K1/03
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