发明名称 |
ORGANIC COMPOSITE MATERIAL |
摘要 |
<p>PURPOSE:To improve the adhesivity of a coating film to an organic material used as the substrate by pretreating the substrate with plasma of a gas such as argon or hydrogen before forming a coating film by a plasma CVD process and sputtering the substrate with the ion of the above inert gas, thereby cleaning the surface of the substrate. CONSTITUTION:A coating film is formed on the surface of an organic material having unsaturated carbon bond by a plasma CVD process using a compound expressed by formula SixC1-x (0<=x<=1) together with hydrogen and a halogen element such as fluorine.</p> |
申请公布号 |
JPH04261439(A) |
申请公布日期 |
1992.09.17 |
申请号 |
JP19910042806 |
申请日期 |
1991.02.14 |
申请人 |
SEMICONDUCTOR ENERGY LAB CO LTD |
发明人 |
HAYASHI SHIGENORI;SATO MASAHIKO |
分类号 |
C08J7/00;B05D7/24;C08J7/04;C23C16/32 |
主分类号 |
C08J7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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