发明名称 ORGANIC COMPOSITE MATERIAL
摘要 <p>PURPOSE:To improve the adhesivity of a coating film to an organic material used as the substrate by pretreating the substrate with plasma of a gas such as argon or hydrogen before forming a coating film by a plasma CVD process and sputtering the substrate with the ion of the above inert gas, thereby cleaning the surface of the substrate. CONSTITUTION:A coating film is formed on the surface of an organic material having unsaturated carbon bond by a plasma CVD process using a compound expressed by formula SixC1-x (0<=x<=1) together with hydrogen and a halogen element such as fluorine.</p>
申请公布号 JPH04261439(A) 申请公布日期 1992.09.17
申请号 JP19910042806 申请日期 1991.02.14
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 HAYASHI SHIGENORI;SATO MASAHIKO
分类号 C08J7/00;B05D7/24;C08J7/04;C23C16/32 主分类号 C08J7/00
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