| 摘要 |
PURPOSE:To attempt high density of the arrangement of thin film coil blocks by making the pattern of an insulation film layer a pattern that is connected between thin film blocks that are adjacent to each other. CONSTITUTION:Simultaneous mask evaporation is applied to the surface of a substrate 10 to form terminal conductor 12 on one side of each coil block 11. Next, simultaneous mask evaporation is applied to the positions where a coil conductor layer 15 and a conductor layer 12 are connected. After this, an insulation film layer 16 by mask evaporation is formed to cover partially each coil conductor layer 15. This insulation film layer 16 has a continuous pattern between adjacent coil blocks 11. Next, coil conductor layers 17 with a pattern that is different from that of the conductor layer 15 are formed simultaneously by mask evaporation so as to overlap the exposed face of the conductor layer 15 by one end of the coil conductor layer 17. The other end of the coil conductor 16 is formed on one end of the conductor layer 15 through the insulation film layer 16. A thin film coil of one turn is constituted with these conductor layers 15 and 17. |
