| 摘要 |
The N-tert-butoxymaleimide/styrene copolymer is produced by radical- copolymerizing N-tert-butoxymaleimide monomer and styrene derivative in the presence of a radical copolymerization initiator i.e. benzoyl peroxide or azobis (isobutylonitrile). The styrene derivative is pref. styrene, p-acetoxy styrene, p-methyl styrene, p-chloro styrene, m-chloromethyl styrene, p-tert- butoxycarbonyloxy styrene or p-trimethylsilyl styrene. The copolymer is used as a microlithographic resist having a high radiation-sensibility, resolution and heat resistance.
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