| 摘要 |
The present invention provides compounds of the general formula:
<CHEM>
wherein
R<1> is an aryl, ar(lower)alkyl or pyridyl radical, each of which may be substituted by halogen, amino, lower alkyl, lower alkoxy or carboxy(lower)alkyl,
R<2> is a hydrogen or halogen atom,
R<3> is an amino, lower alkylamino, acylamino or nitro radical,
R<4> is a divalent radical of the general formula -CnH2n- in which n is an integer of from 1 to 7, and
A is oxy, thio, sulfinyl, sulfonyl or imino,
the derivatives of the carboxy group, and the pharmaceutically acceptable salts thereof.
<??>The present invention also provides processes for the preparation of these compounds, as well as pharmaceutical compositions containing them. |
