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发明名称
FORMATION OF SILICON DIOXIDE LAYER
摘要
申请公布号
GB8329380(D0)
申请公布日期
1983.12.07
申请号
GB19830029380
申请日期
1983.11.03
申请人
RCA CORPORATION
发明人
分类号
H01L21/316;H01L21/321;(IPC1-7):H01L21/31
主分类号
H01L21/316
代理机构
代理人
主权项
地址
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